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a large amount of boron added in the silica thin film, and also the evaluation of the double refraction and the thought method

机译:二氧化硅薄膜中添加了大量的硼,以及双折射的评价和思想方法

摘要

this invention is related to optical communication and optical industry used silicon to judging the boron, (p), germanium (Ge), titanium (Ti). the film's name is also the element and a double refraction occurs as a new kind of method to reduce the uc704ud55c be about to according to the invention, the flame hydrolysis method for coating thin film of silica production in the process of the film or in the buffer, the core and the primary layer of each layer. a large amount of boron is added to the method, the thermal expansion rate of the silica layer a lot of. as the liquid in the high transition temperature as low as a line dance, double refraction to have purpose, flame hydrolysis reaction in the coating of the particle layer to melt the film culture and to make the fire warm blooded and the amount of boron. in the box. in short, the stability of a silica thin film with high quality in order to make the invention.
机译:本发明涉及光通信和光学工业,用硅来判断硼,(p),锗(Ge),钛(Ti)。薄膜的名称也是元素,并且双折射是一种减少 uc704 ud55c的新方法,根据本发明,火焰水解方法用于在薄膜加工过程中涂覆二氧化硅生产薄膜或在缓冲区,每一层的核心和主要层。该方法中添加了大量的硼,二氧化硅层的热膨胀率很大。由于液体在高转变温度低至线舞,双重折射达到目的后,火焰水解反应在涂层的颗粒层融化了膜的培养物,并使火势与硼的血量相热。在盒子里面。简而言之,是高质量的二氧化硅薄膜的稳定性,以实现本发明。

著录项

  • 公开/公告号KR19980067754A

    专利类型

  • 公开/公告日1998-10-15

    原文格式PDF

  • 申请/专利权人 권문구;

    申请/专利号KR19970004023

  • 发明设计人 박인식;고한준;이형종;이용태;

    申请日1997-02-12

  • 分类号H01P11/00;

  • 国家 KR

  • 入库时间 2022-08-22 02:47:44

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