pulse to the cathode to have injected into the plasma

摘要

ion to make the work into the conflict between the work surface, with surface treatment method and device. injection chamber (12) and one or more products to be inserted in the chamber interior and the chamber formed within the inner wall close to the government, including (22). the body of the work support (30) is injected into the chamber to the interior space. the electrode (32) is made the work support and the electrode between the body region (34) in the work in the future to support the figure in the work support for the distribution of the injection chamber. gas, gas molecules are made of one or more products in a casting chamber adjacent to the area to try to capture the injection chamber by injection. the gas is injected to the surface of the work near the ionization.the control circuit (100) has a support body to one or more of the work, the work, and the injection chamber of the wall in the fields for the pulse oscillation on an electrode. to control the ion the gas molecules with the surface of one or more products is responsible for the good before the acceleration electric field with the voltage source, including.