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Measurement method of coincidence error and measurement pattern of coincidence error
Measurement method of coincidence error and measurement pattern of coincidence error
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机译:重合误差的测量方法和重合误差的测量模式
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摘要
It is possible to measure the coincidence error with high precision, and furthermore, the coincidence coincidence can be easily measured even after the semiconductor device is manufactured.;The distances between the edge portions 11a to 15a of the wirings 11 to 15 and the openings 21 to 25 provided in the insulating film covering the wirings 11 to 15 are sequentially changed in the same direction, The conduction state between the openings 11 to 15 and the openings 21 to 25 is checked. The number of sets of interconnecting wires 11 to 15 and the openings 21 to 25 is different by the matching error between the wirings 11 to 15 and the openings 21 to 25 in the same direction, . /RTI
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