the value of the oil production, the connection resistance between the ic and the performance of new processing technology for (free on rail ACHIEVING NOVEL PROCESSING TECHNIQUES PRODUCTION - WORTHY, LOW DIELECTRIC, LOW INTERCONNECT RESISTANCE and HIGH PERFORMANCE ic)

摘要

a metal line (14) in a semiconductor device with mutual connection part (18) of copper, gold, or platinum and a low resistance metal form and let be the benzo derivatives or with his constant with the medium (20); the uc7acuc9c8uc5d0 of separation. the three - layer of resistance structure (16) lift off process and the mutual connection part (18); the formation of very useful. the dielectric constant of material (20) has a low resistance metal (18) on the proliferation of the spread from the provide. the three - layer resistance (16) as the first layer of polymer material (16a), a hard mask material of the second layer (16b) and the resistance of the material layer (16c) etc.. the results of the structure increases the speed and made a integrated company easy to provide.