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FAILURE ANALYSIS SYSTEM AND FAILURE ANALYZING METHOD FOR THIN FILM HEAD PRODUCT

机译:薄膜头产品的故障分析系统和故障分析方法

摘要

PROBLEM TO BE SOLVED: To enhance yield while shortening countermeasure times by arranging to display inspection results of plural pieces of chips based on positions of wafers in a wafer unit to facilitate the analyzing of failure factors such as extending over plural processes. ;SOLUTION: Wafers 112, blocks 113 and thin film products 114 to be manufactured in a thin film forming process 109, a machining process 110 and an assembling process 11 are inspected by corresponding inspection instrument groups A to C 103 to 105. The inspection instrument group A103, the inspection instrument group B104 and the inspection instrument group C105 respectively transmit inspection results, wafer numbers and chip addresses being in the wafers and inspection results, wafer numbers, block numbers and chip addresses being in the blocks and inspection results, chip numbers, block numbers to which the chips belonging and wafer numbers to a quality database 102 as inspection data. Moreover, an analyzing terminal 101 mappingly displays inspection results belonging to the same wafer by totalizing them.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:通过基于晶片单元中晶片的位置来显示多片芯片的检查结果,从而在提高生产率的同时缩短对策时间,从而有助于分析诸如扩展多个工艺之类的故障因素。 ;解决方案:要在薄膜形成过程109,机加工过程110和组装过程11中制造的晶圆112,块113和薄膜产品114由相应的检查仪器组A至C 103至105进行检查。组A103,检查仪器组B104和检查仪器组C105分别发送检查结果,晶片编号和芯片地址在晶片中以及检查结果,晶片编号,块编号和芯片地址在块中以及检查结果,芯片编号芯片所属的块号和晶片号作为检查数据到达质量数据库102。而且,分析终端101通过累加它们来映射显示属于同一晶片的检查结果。COPYRIGHT:(C)1999,JPO

著录项

  • 公开/公告号JPH11161917A

    专利类型

  • 公开/公告日1999-06-18

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19970327530

  • 发明设计人 SEKI TAKAFUMI;FUJIWARA SHOICHIRO;

    申请日1997-11-28

  • 分类号G11B5/31;

  • 国家 JP

  • 入库时间 2022-08-22 02:37:12

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