MULTILAYER FILM X-RAY REFLECTOR AND LASER PLASMA X-RAY GENERATOR USING IT

摘要

PROBLEM TO BE SOLVED: To realize high intensity, high efficiency and a long life of a device by adopting Ru or Rh as a material for one layer and Be or a compound of metals or a compound prepared by adding a light element to a metal as a material for the other layer. ;SOLUTION: After an RF magnetron sputtering device with material targets is used and a film forming chamber is evacuated to the 10^-8Torr range, Ar gas is introduced into the film forming chamber to obtain an Ar atmosphere under the pressure of 3×10^-3Torr. Afterward, discharge is caused and a multilayer film is formed by forming Mo layers and Be layers over and over again. The number of pairs of both layers is 40 and the period length is 6 mm. As to the relation of the wavelength with the reflectance in the multilayer film, the maximum reflectance 62% is exhibited when the thickness of the Mo layers is 50% of the period length. Moreover, the high reflectance, not less than 40%, is exhibited in the range between 20% and 70% of the period length in the thickness of the Mo layers.;COPYRIGHT: (C)1999,JPO