HIGH-FREQUENCY POWER SOURCE DEVICE FOR DEPOSITION APPARATUS, POSITION REGULATOR AND DISCHARGE STATE FLUCTUATION RATE MONITOR

摘要

PROBLEM TO BE SOLVED: To provide a high-frequency power source device for a deposition apparatus capable of executing optimum control at each of processes of deposition by executing the optimum setting of a set value according to these process, a phase regulator and a discharge state fluctuation rate monitor. ;SOLUTION: This phase regulator 10 is used for the deposition apparatus which executes the deposition by forming a discharge state by supplying high-frequency electric power to counter electrodes 2, 3, respectively, disposed in a vacuum vessel 1. The high-frequency power source device has a monitor sensor 20 which is connected to the counter electrodes 2, 3, respectively, and detects the voltage of the respective electrodes 2, 3, a means which detects the voltage phase difference of the electrodes 2, 3 in accordance with the detection output of this monitor sensor 20 and a means which previously programs the set value of the voltage phase difference and relatively displaces the phase of the high-frequency electric power to control the relative displacement of the phase of the high-frequency electric power so as to diminish the deviation between the set value and the detected phase difference in accordance with this program.;COPYRIGHT: (C)1999,JPO