METHOD FOR ADSORPTIVE REMOVAL OF ARSENIC ION

摘要

PROBLEM TO BE SOLVED: To selectively and efficiently adsorb arsenic ion and repeatedly carry out adsorptive removal at high reproducibility by using an adsorbent produced by dispersedly depositing hydrated zirconium oxide in the surface of fine pores of a porous material and the crystallizing the resultant material. ;SOLUTION: Hydrated zirconium oxide having a formula MO₂.nH₂O (M is zirconium; n is an integer from 1 to 6) is deposited in 5-60 wt.% ratio in a porous material of a porous polymer and heated to selectively adsorb arsenic. An aqueous alkaline solution is passed through the adsorbent adsorbing arsenic to elute arsenic out of the adsorbent. The concentration of the aqueous alkaline solution to be passed for elution is preferably 0.1-3 mole. To use the adsorbent for adsorptive removal of arsenic ion again after the aqueous alkaline solution is passed through the adsorbent, it is necessary to carry out conditioning of resin with a weakly acidic buffer solution. The buffer solution to be used except phosphoric acid type ones is not specifically limited as long as the buffer solution has pH 2-6.;COPYRIGHT: (C)1999,JPO