METHOD FOR JUDGING MASK OF CGH ELEMENT FUR GAUSSIAN BEAM

摘要

PROBLEM TO BE SOLVED: To judge whether a mask for manufacturing a computer generated hologram(CGH) element for Gaussian beams can be comparatively easily used for photolithography or not. ;SOLUTION: The width dimensions P of a mask part 14b on a boundary of a lens area expressed by an optical path difference function ρ (x, y) is calculated, a minimum width dimension Pmin out of the calculated width dimensions P is compared with an allowable error in photolithography to judge whether masks 13a, 13b including the mask part 14b can be applied to the photolithography or not.;COPYRIGHT: (C)1999,JPO