ZrO2 thin film and TiO2 thin film and the production manner

摘要

PURPOSE: To form a thin film of ZrO₂ or TiO₂ having a specified content of free carbon by supplying the β-diketon complex of Zr or Ti and gaseous oxygen on the surface of an Si substrate in a vacuum chamber and irradiating the substrate with a laser beam parallel to the substrate. ;CONSTITUTION: A vessel contg. an Si substrate 1 is evacuated, and the substrate 1 is heated to 510-600°C. A raw gas 4 consisting of the β-diketon complex of Zr or Ti and oxygen is supplied on the substrate 1, an XeCl excimer laser beam 2 is introduced into the vessel through an optical window 3 to irradiate the β-diketon complex of Zr or Ti without irradiating the substrate 1, the raw gas is brought into contact with the substrate 1 surface, and the ZrO₂ film or TiO₂ film contg. ≥30wt.% of free carbon is formed on the substrate 1.;COPYRIGHT: (C)1994,JPO