HIGH FREQUENCY ANTENNA FOR INDUCTION COUPLING PLASMA AND INDUCTION COUPLING PLASMA SOURCE WITH THE ANTENNA

摘要

PROBLEM TO BE SOLVED: To efficiently generate plasma by constituting the subject antenna of a metal member disposed in the vicinity of inductor wall of a plasma processing chamber and bent to have a letter U shaped cross section. ;SOLUTION: To an rf antenna 11 having a letter U shaped cross section an rf current is supplied from an rf power source 17 via a matching circuit 18. At an open end part of the antenna 11 voltages on both sides in any end are identical if it stands on the same radial axis of the antenna 11. No static coupling, therefore, exists between the open edges of the antenna 11. According to the constitution, in both open edges of the antenna 11 an induction magnetic field passes through the inside of a flat plate type ICP reaction vessel 13. The are a of the induction magnetic field existing in the vessel 13 does not become larger than the same area by a linear metallic strip having the same size. This provides a higher power transmission efficiency from the antenna 11 to the plasma generated in the vessel 13.;COPYRIGHT: (C)1999,JPO