首页> 外国专利> Profile microstructure observation manner and observation device

Profile microstructure observation manner and observation device

机译:型材微结构观察方式及观察装置

摘要

PURPOSE:To make it possible to observe the cross section of fine structure in any arbitrary region of a sample. CONSTITUTION:A gas intake mechanism is additionally installed to a scanning type microscope so as to provide an etching performance by allowing a processed workpiece to adsorb active gas and emitting electron beam to the processed workpiece (electron beam excitation dry etching function). A sample to be observed is partially etched and eliminated by using this device so that the cross section may be exposed. Then, cross section observation in a fine region is carried out by tilting the sample. This construction makes it possible to observe the cross section in any fine region and to prepare a sample in the same vacuum tank continuously.
机译:目的:使在样品的任意区域观察精细结构的横截面成为可能。构成:在扫描型显微镜上还安装了一个进气机构,以通过允许加工后的工件吸收活性气体并向加工后的工件发射电子束来提供蚀刻性能(电子束激发干法蚀刻功能)。通过使用该装置将要观察的样品部分蚀刻并去除,从而可以暴露出横截面。然后,通过使样品倾斜来进行微小区域的截面观察。这种结构使得可以观察任何细微区域的横截面,并在同一真空罐中连续制备样品。

著录项

  • 公开/公告号JP2976558B2

    专利类型

  • 公开/公告日1999-11-10

    原文格式PDF

  • 申请/专利权人 NIPPON DENKI KK;

    申请/专利号JP19910053507

  • 发明设计人 WATABE HEIJI;MATSUI SHINJI;

    申请日1991-02-27

  • 分类号H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-22 02:30:21

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号