Manner null for precipitating a thinner and extremely thin

摘要

PURPOSE: To form desired thin layers on a substrate surface at a deposition rate regardless of places by forming a target surface as a curved surface and combining the movement in an X-Y direction and the movement in a Z direction by a specified system. ;CONSTITUTION: A laser beam 1 is made incident at the target surface 2 bent at a minus angle. The focus 4 of the laser beam 1 is fixed to X₁, Y₁, Z₁ while the formation is maintained in the layer. The target moves rectilinearly in an X-axis direction in order to change to direction of the normal 3 of a target surface element with respect to the normal 5 of the substrate. The bending of the target surface 2 gives rise to a change in the corresponding direction of the normal 3 in the X-Z surface. As a result, a change in the inclination with the normal 5 of the substrate or a change in the incident place of a plasma cloud on the substrate is induced. A guide 6 of a mold forces the correction of the place of the target surface 2 region irradiated in the Z direction order to hinder the deviation of the focus 4 of the laser beam from the target surface 2. As a result, the intersected point of the normal 3 of the target surface element of the substrate surface may be introduced along the longitudinally axis 7 of the substrate under specified evaporation conditions.;COPYRIGHT: (C)1995,JPO