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Magnetic field immersion model electron gun and magnetic field immersion die electron gun manipulation manner

机译:磁场浸没式电子枪和磁场浸没模电子枪的操纵方式

摘要

PURPOSE: To reduce color aberration and spherical aberration of an electrostatic lens system possessed by an electro gun by focusing electron beams generated from a cathode by means of the electrostatic lens the superposing strong electromagnetic field at a point where the aberration of the electron beam becomes remarkable. ;CONSTITUTION: In vacuum containers 215 and 217, thermoelectrons generated at a cathode 201 are accelerated by an anode 205 to form an electron beam. The electron beam is focused on a central axis by electric field generated by an electrostatic lens. The electrostatic lens is disposed between the cathode and the anode and formed of a drawing electrode 203 close to the cathode 201 and a lens electrode 204. An annular electromagnet 220 formed of a coil a magnetic body 209 disposed around the electron beam is provide outside the vacuum container 215 so as to generate magnetic field for focusing the electron beam. Then, the annular electromagnet 220 is adjusted in its position by a moving mechanism 221 so that the peak value of the abovementioned magnetic field strength is controlled to coincide with a point where aberration is most remarkable in the electrostatic lens.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:通过利用静电透镜将从阴极产生的电子束聚焦,在电子束的像差变得显着的点上叠加强电磁场,从而降低电子枪所拥有的静电透镜系统的色差和球面像差。组成:在真空容器215和217中,在阴极201处产生的热电子被阳极205加速以形成电子束。电子束通过静电透镜产生的电场聚焦在中心轴上。静电透镜设置在阴极和阳极之间,并且由靠近阴极201的引出电极203和透镜电极204形成。由线圈和围绕电子束布置的磁体209形成的环形电磁体220设置在电子束的外部。真空容器215,以便产生用于聚焦电子束的磁场。然后,通过移动机构221调节环形电磁体220的位置,以使上述磁场强度的峰值被控制为与静电透镜中像差最显着的点一致。 1994,日本特许厅

著录项

  • 公开/公告号JP2835265B2

    专利类型

  • 公开/公告日1998-12-14

    原文格式PDF

  • 申请/专利权人 TOSHIBA KK;

    申请/专利号JP19930211848

  • 申请日1993-08-26

  • 分类号H01J37/073;H01J37/145;

  • 国家 JP

  • 入库时间 2022-08-22 02:29:11

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