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Smear quantitative measuring method null of

机译:涂片定量测量方法

摘要

PURPOSE:To measure smear quantity with high accuracy by providing a second process to measure the output voltage of an output part as a second output voltage and a third process to calculate the smear quantity based on the ratio of the second output voltage to a first output voltage. CONSTITUTION:By impressing a voltage at a high level to a substrate 2, a so-called electronic shutter operation is obtained to sweep signal charges stored in a photosensitive part 3 out to the substrate 2. By this electronic shutter operation, the generation of blooming can be prevented in the case of irradiation with the excess quantity of light. Therefore, by using the output voltage of the output part in the case of an electronic shutter and the output voltage in the case of a normal operation impressing a voltage at a low level to the substrate 2 as the calculation parameters of the smear quantity, accuracy for measuring the smear quantity is improved. Thus, since the smear quantity can be measured without being affected by the blooming operation by the electronic shutter operation even in the case of irradiation with the excess quantity of light, accuracy for measurement can be improved.
机译:目的:通过提供第二过程来测量输出部件的输出电压作为第二输出电压,并提供第三过程来基于第二输出电压与第一输出的比率来计算拖尾量,从而高精度地测量拖尾量电压。组成:通过向基板2施加高电压,可以实现所谓的电子快门操作,将存储在感光部件3中的信号电荷扫出到基板2。通过这种电子快门操作,可以产生光晕在用过量的光照射的情况下,可以防止这种情况。因此,通过将电子快门的情况下的输出部的输出电压和正常操作的情况下的向基板2施加低电平的电压作为涂污量的计算参数,来使用输出电压。用于测量涂片量的方法得到改进。因此,由于即使在用过量的光照射的情况下,也可以不受电子快门操作的起霜操作的影响而测量涂抹量,因此可以提高测量精度。

著录项

  • 公开/公告号JP2853310B2

    专利类型

  • 公开/公告日1999-02-03

    原文格式PDF

  • 申请/专利权人 SONII KK;

    申请/专利号JP19900258514

  • 发明设计人 SUZUKI SATOYUKI;

    申请日1990-09-27

  • 分类号H04N5/335;G01J1/44;G01R31/26;H01L27/14;H01L27/148;H04N17/00;

  • 国家 JP

  • 入库时间 2022-08-22 02:28:53

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