The invention relates to a method and an apparatus for producing microlithographic patterns, in particular to the writing of photomasks for and direct writing of computer displays, microelectronic devices, and precision photoetching. It is also applicable to optical devices and a variety of electronic interconnection structures such as multichip modules. Other applications are possible, such as printing and graphics, as well as laser projection displays. More specifically the invention comprises a method and apparatus for writing of lithographic patterns with raster scanning technique comprising the use of an electronic clock to control the modulation of the beam where the placement in the scanning directions of pattern elements is controlled by time delays of at least one clock signal by fractions of a clock period where said clock period is divided into a number of preferably equally spaced delay time values by means of a delay-locked loop (DLL) and a particular delay time value is chosen according to a digital control word.
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