Method and device for determining and controlling the composition of the reactive gas mixture that acts on a substrate in the course of a physical-chemical treatment under rarefied atmosphere.

摘要

METHOD AND DEVICE FOR DETERMINING AND MONITORING THE COMPOSITION OF GAS MIXTURE REACTIVA acting on a substrate during a physico-chemical treatment under an atmosphere rarefied, which process comprises an analysis spectroscopic EMISSIONS OF PLASMA VAPOR GENERATED AT THE LEVEL OF A WHITE (10) Subject to an arc discharge, dEDUCT THE RESULT OF THIS ANALYSIS THE CONCENTRATION OF rADIANT SPECIES AND ACTING ON DIFFERENT PARAMETERS OF INSTALLATION SUCH AS ELECTRIC AND MAGNETIC FIELDS APPLIED TO WHITE (10) AND ON GAS FLOWS TO MAINTAIN cONCENTRATION IS DESIRED LEVEL. The invention is mainly applied to monolayers DEPOSITS OR MULTI-METALLIC carbonitrides elements such as a substrate (3).