SCANNING EXPOSURE METHOD, SCANNING ALIGNER, METHOD OF MANUFACTURING THE SCANNING ALIGNER, AND SYNCHRONIZATION ERROR ANALYSING METHOD

摘要

A main control system (18) monitors the positions of a mask (R) and a sensitive substrate (W) while the mask (R) and the substrate (W) are moved relative to each other, calculates the error of synchronization between the mask (R) and the substrate (W) based on the result of monitoring, and, according to the synchronization error, selects at least one of the movement average and the standard deviation of movement so as to analyze the synchronization accuracy of the mask (R) and the substrate (W) during scanning for each factor affecting the result of exposure. Thus, the use of movement average makes it possible to evaluate quantitatively to some extent the effect of the synchronization error on the misalignment of the pattern transferred onto the substrate (W), and the use of the standard deviation of movement makes it possible to evaluate quantitatively to some extent the effect of the synchronization error on the deterioration of the pattern resolution.