METHOD FOR CONTROLLING THE PARAMETERS OF THIN-FILM COATINGS AND SURFACES IN REAL TIME AND DEVICE FOR REALISING THE SAME

摘要

The present invention pertains to the field of thin-film techniques and more precisely relates to methods for controlling the parameters of thin-film coatings and surfaces during the modification process thereof. The device of the present invention comprises an X-ray source and a recording system which are connected to an industrial system. The source is capable of radiating the model using simultaneously waves of different lengths, while the recording system records the reflected radiation simultaneously and independently at two or more wavelengths. The method involves radiating the model at an angle Υ using an X-ray beam having two wavelengths μ1 and μ2, and simultaneously recording the reflected X-ray beam at said wavelengths. By observing the oscillations in the specular-reflected beam, it is possible to determine the modification in the thickness of the thin-film coating. The density and the roughness of the thin film are obtained by the alignment of theoretical-relation points with experimental-relation points.