The present invention relates to a linear torch having a one-dimensional particle distribution that burns hydrogen in a flame hydrolysis deposition process to form a flame and deposits silica particles generated by oxidation and hydrolysis reactions onto a wafer, wherein the nozzle of the torch is flamed. The nozzle outlet for the raw material gas and the nozzle outlet for the chemical reaction gas are provided, and one side of the nozzle outlet for the chemical reaction gas has a structure larger than the diameter of the wafer. In addition, the nozzle outlet of the linear torch is a rectangle, and has a plurality of rectangular nozzle outlets with coincident central axes, and the nozzle outlet for the chemical reaction gas and the nozzle for the first flame raw material gas from the inside of the plurality of rectangular nozzles to the outside. The outlet and the nozzle outlet for the second flame raw material gas are located, wherein one side of the rectangle of the nozzle outlet for the chemical reaction gas is larger than the size of the wafer.;According to the present invention, since the particle distribution has a one-dimensional linear distribution, a uniform film can be obtained by fixing the wafer and transferring only the torch. In addition, since the particle distribution is wider than that of the circular nozzle outlet and larger than the diameter of the wafer, the deposition time required to obtain a constant thickness can be shortened, which is suitable for mass production.
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