This seed system using an ISA plasma generator and an ISA plasma generator

摘要

In the ECR plasma generator, a high frequency in the range of 3 MHz to 300 MHz is provided in a chamber having an exhaust system from a high frequency power supply and provided to an electrode serving as a gas introducing showerhead, and power is supplied to a coil provided in the outer periphery of the chamber Thereby forming a magnetic field larger by an integral multiple of the resonance magnetic field corresponding to the high frequency applied in parallel to the direction of the electric field to generate the ECR plasma in the atmosphere of the supplied process gas.