Optimization Control Method of BPS Process

摘要

After the BPSG process is performed on the wafer, the optimum process environment is reset by referring to the measured thickness of the generated BPSG film, and the reset process environment is applied to the next BPSG process to ensure that the BPSG process proceeds to an optimal state. An optimization control method for a BPSG process is disclosed.;According to the present invention, the step of performing the BPSG process at the first belt speed, the step of measuring the advanced planarization film to calculate the measurement data, and compares and arithmetic the first belt speed and the calculated measurement data to determine the second belt speed And calculating the planarization film by the calculated second belt speed.