COMPOSITION FOR PROTECTION OF SKIN AND/OR HAIR AGAINST ULTRAVIOLET RADIATION, METHOD OF ITS PHOTOSTABILIZATION, STABILIZING AGENT OF THIS COMPOSITION AND METHOD OF PROTECTION OF SKIN AND/OR HAIR AGAINST ULTRAVIOLET RADIATION

摘要

FIELD: cosmetics. SUBSTANCE: invention relates to the cosmetic photoresistant composition used for protection of skin and/or hair against ultraviolet radiation. Composition comprises in a carrier a derivative of dibenzoylmethane as a filter that shows effectiveness in UV-A region and polysaccharide alkyl ether. The latter is formed by links containing different ozidium cycles being each link has hydroxyl-group substituted with saturated hydrocarbon alkyl chain and used as a stabilizing agent in this composition. Invention relates to also a method of photostabilization of the composition and a method of skin and hair protection against effect of ultraviolet radiation. EFFECT: photostability of the composition. 44 cl, 2 tbl, 2 ex