Solution of tetramethylammonium hydroxide in water and process for preparing the solution

摘要

A solution of tetramethyl ammonium hydroxide in water contains a surfactant component and a hydrotropic component. A process for preparing a solution for developing exposed photoresists has the following steps: preparation of a solution of tetramethyl ammonium hydroxide in water; admixture of a surfactant component and admixture of a hydrotrophic component.