local finite microlaser passively by absorbing strong saturable and its manufacturing process

摘要

The invention relates to a microlaser cavity (10), comprising: & br / - a solid active medium (2) emitting at least in a range of wavelengths between 1,5 and 1,6 pm, and & br / - a saturable absorber (4) of formula caf2: co * * 2 + or mgf2: co * * 2 + or srf2: co * * 2 + or baf2: co * * 2 + or la0,9 mg0,5 - x cox al11,433 o19 or yalo3: co * * 2 + (or yal5 - 2x cox six o3) or y3 al5 - x - y gax scy o12: co * * 2 + (or y3 al5 - x - y - 2z gax scy catalyst siz o12) or y3 - x lux al5 o12: co * * 2 + (or y3 - x lux al5 - 2y coy siy o3) or sr1 - x - y al12 mgx lay o12: co * * 2 + (or sr1 - x - y mgx coy, al12 - z o12, with o ≦ y ≦ x / p) .par.