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Partial clean fluorine thermal cleaning process
Partial clean fluorine thermal cleaning process
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机译:部分清洗氟热清洗工艺
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摘要
A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with a thermally activated source of fluorine, such as nitrogen trifluoride, at an elevated temperature, typically at the process operation temperature, wherein the cleaning is terminated prior to complete cleaning and removal of undesired substances allowing rapid restart of fabrication equipment so cleaned.
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