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Copper anode assembly for stabilizing organic additives in electroplating of copper

机译:用于稳定电镀铜中有机添加剂的铜阳极组件

摘要

A process and assembly for stabilizing organic additives in an electrolytic solution while electroplating copper. The process includes forming a protective film on a first surface of an anode and minimizing contact between the electrolytic solution and a second surface of the anode which is further from the cathode than the first surface. An anode housing is used to minimize contact between the electrolytic solution and the second surface of the anode. The housing includes two side walls and a bottom wall, each having a groove, and a sealing back plate. The anode is fitted in the grooves such that the first surface of the anode is in contact with the electrolytic solution and the second surface of the anode abuts against the sealing back plate. The anode housing may be used in an electroplating system including the anode housing, a plating tank containing the electrolytic solution, a cathode immersed in the electrolytic solution, and an anode, which preferably is in the shape of a slab.
机译:一种在电镀铜时稳定电解液中有机添加剂的方法和装置。该方法包括在阳极的第一表面上形成保护膜,并使电解液与阳极的第二表面之间的接触最小,该第二表面比第一表面更远离阴极。阳极壳体用于最小化电解液与阳极的第二表面之间的接触。壳体包括两个侧壁和底壁,每个侧壁和底壁分别具有凹槽和密封背板。将阳极装配在凹槽中,使得阳极的第一表面与电解液接触,并且阳极的第二表面抵靠密封背板。阳极壳体可以用在电镀系统中,该电镀系统包括阳极壳体,容纳电解液的镀槽,浸入电解液中的阴极和优选为平板状的阳极。

著录项

  • 公开/公告号US5908540A

    专利类型

  • 公开/公告日1999-06-01

    原文格式PDF

  • 申请/专利权人 INTERNATIONAL BUSINESS MACHINES CORPORATION;

    申请/专利号US19970908505

  • 发明设计人 LISA A. FANTI;

    申请日1997-08-07

  • 分类号C25C7/00;C25D17/02;

  • 国家 US

  • 入库时间 2022-08-22 02:08:05

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