首页> 外国专利> Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage

Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage

机译:投影曝光设备和方法,其中掩模台被移动以提供与移动的晶片台的对准

摘要

A projection exposure apparatus for positioning, for each shot provided on a wafer, a pattern formed on a mask with respect to the wafer and also for exposing the pattern on the wafer includes a wafer stage carrying the wafer and movable stepwise for each shot, a mask stage carrying the mask and movable, a stage control unit for making relative positioning between the wafer and the pattern of the mask and maintaining the relative positioning so that the stage control unit moves the mask stage to make the relative positioning before the wafer stage stops for each shot, and an exposure control unit for performing exposure while the relative positioning is maintained.
机译:一种投影曝光设备,其用于对设置在晶片上的每个镜头定位相对于晶片形成在掩模上的图案,并且还用于在晶片上曝光该图案,该投影曝光设备包括:载物台,其载有晶片并且对于每个镜头可步进移动。掩模台,其承载掩模并且是可移动的,其台控制单元用于在晶片和掩模的图案之间进行相对定位并保持相对定位,使得台控制单元在晶片台停止之前移动掩模台以进行相对定位。曝光控制单元,用于在保持相对位置的同时进行曝光。

著录项

  • 公开/公告号US5978071A

    专利类型

  • 公开/公告日1999-11-02

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;

    申请/专利号US19980084211

  • 申请日1998-05-26

  • 分类号G03B27/42;G03B27/52;G03B27/54;G03B27/72;

  • 国家 US

  • 入库时间 2022-08-22 02:06:55

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