首页> 外国专利> MANUFACTURE OF ATMOSPHERIC PRESSURE-RESISTANT SUPPORT STRUCTURE FOR ELECTRON BEAM DEVICE, ATMOSPHERIC PRESSURE-RESISTANT SUPPORT STRUCTURE FOR ELECTRON BEAM DEVICE AND ELECTRON BEAM DEVICE

MANUFACTURE OF ATMOSPHERIC PRESSURE-RESISTANT SUPPORT STRUCTURE FOR ELECTRON BEAM DEVICE, ATMOSPHERIC PRESSURE-RESISTANT SUPPORT STRUCTURE FOR ELECTRON BEAM DEVICE AND ELECTRON BEAM DEVICE

机译:电子束装置的耐压支撑结构的制造,电子束装置的耐压支撑结构和电子束装置的制造

摘要

PROBLEM TO BE SOLVED: To easily and stably carry out smoothing at a high yield ratio in the case where smoothing a cut surface of an atmospheric pressure-resistant support structure prepared by a cutting machining is carried out in order to prevent a break of the atmospheric pressure-resistant support structure and a surface discharge on a surface of the atmospheric pressure-resistant supporting structure when a wall of an air tight container is supported by the atmospheric pressure-resistant supporting structure in the air tight container of an electron beam device. ;SOLUTION: An insulation substrata 1, i.e., a spacer supporting a wall of an air tight container accommodating an electron releasing element is prepared by cutting a mother material. A fine projection and a fine chip generated on a cut surface 1a by a cutting machining are made to a smooth shape by annealing carried out by heating the cut surface 1a of the insulation substrate 1 at a higher temperature than a softening point of a constitution material of the insulation substrate 1. Break of the insulation substrate caused by a concentration of a stress to the chip of the insulation plate 1 and a concentration of an electric field to the projection and the chip are prevented.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:在为了通过切割加工对耐大气压力的支撑结构的切割面进行平滑化以防止大气破裂的情况下,容易且稳定地以高成品率进行平滑化。耐压支撑结构和在电子束装置的不透气容器中将耐压容器的壁支撑在耐压容器的壁上时的耐压支撑结构的表面的表面放电。 ;解决方案:通过切割母体材料来制备绝缘基质1,即支撑容纳电子释放元件的气密容器壁的垫片。通过在比构成材料的软化点高的温度下对绝缘基板1的切割面1a进行加热而进行的退火,使通过切割加工而在切割面1a上产生的微细突起和微细芯片成为平滑的形状。防止绝缘基板的破裂是由于应力集中到绝缘板1的芯片上以及电场集中到突起和芯片上而引起的;版权所有:(C)2000,日本特许厅

著录项

  • 公开/公告号JP2000251705A

    专利类型

  • 公开/公告日2000-09-14

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP19990046694

  • 申请日1999-02-24

  • 分类号H01J9/24;H01J5/03;H01J29/87;H01J31/12;

  • 国家 JP

  • 入库时间 2022-08-22 02:05:07

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号