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QUANTITATIVE DETERMINATION METHOD OF TRACE METALLIC ELEMENT

机译:痕量金属元素的定量测定方法

摘要

PROBLEM TO BE SOLVED: To realize an analyzing method of trace metallic elements in a high purity organic silicone resin by converting and separating a silicone contained in an organic silicon-containing polymer resin into silicon dioxide, and then removing the polymer resin through decomposition, and quantitatively analyzing residual metallic impurities. SOLUTION: During a toluene solvent reflux, a polysilane dissolved in toluene, which is obtained in reaction of sodium and methyl phenyl dichlorosilane. Subsequently, for example, the 1 ml polysilane solution is contained in a Teflon container to be subjected to hydrolysis for 1 hr in a state of 10 ml 5% sulfuric acid added and heated at 100 deg.C, so that silicon dioxide is deposited on its surface. Further, a 5 ml nitric acid and hydrofluoric acid-blended solution is added to the solution to then be decomposed at 230 deg.C for 30 min. Next, a 5 ml mitric acid and perchloric acid blended-solution is added for heat decomposition at 230 deg.C and almost completely evaporation of the solution; resulting in a transparent solution. A specimen solution obtained is put on a Zeema atom absorptive device, and a result of quantification is that Na: 5 ppb, K: 3 ppb, Fe: 8 ppb, Cu: 7, 5 ppb, and Al: 10 ppd.
机译:解决的问题:通过将有机含硅聚合物树脂中所含的有机硅转化并分离成二氧化硅,然后通过分解除去该聚合物树脂,以实现高纯度有机硅树脂中痕量金属元素的分析方法。定量分析残留的金属杂质。 SOLUTION:在甲苯溶剂回流过程中,聚硅烷溶解在甲苯中,这是钠和甲基苯基二氯硅烷反应得到的。随后,例如,将1ml聚硅烷溶液容纳在Teflon容器中,以在10ml 5%硫酸的状态下进行水解1小时,并在100℃下加热,从而在其上沉积二氧化硅。它的表面。此外,将5ml硝酸和氢氟酸混合的溶液添加到该溶液中,然后在230℃下分解30分钟。接下来,加入5ml的硝酸和高氯酸的混合溶液,以在230℃下热分解,并使溶液几乎完全蒸发。产生透明的解决方案。将获得的样品溶液放在Zeema原子吸收装置上,定量结果为Na:5 ppb,K:3 ppb,Fe:8 ppb,Cu:7、5 ppb和Al:10 ppd。

著录项

  • 公开/公告号JP2000074800A

    专利类型

  • 公开/公告日2000-03-14

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP19980242907

  • 发明设计人 HAYASHI MASARU;TAKENAKA MIYUKI;

    申请日1998-08-28

  • 分类号G01N1/28;G01N31/00;G01N33/44;

  • 国家 JP

  • 入库时间 2022-08-22 02:02:39

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