首页> 外国专利> GLOW DISCHARGE TREATMENT OF TYPE TO MAKE COMBINATION USE OF HIGH-VOLTAGE PEAK PULSE IMPRESSION AND GLOW DISCHARGE TREATMENT APPARATUS

GLOW DISCHARGE TREATMENT OF TYPE TO MAKE COMBINATION USE OF HIGH-VOLTAGE PEAK PULSE IMPRESSION AND GLOW DISCHARGE TREATMENT APPARATUS

机译:结合高压峰值脉冲表示和辉光放电处理装置组合使用的辉光放电处理。

摘要

PROBLEM TO BE SOLVED: To form a nitrided layer and diffused layer thickly down to the deep depth of an object to be treated without subjecting these layers to post stages and to shorten the glow discharge treatment time. ;SOLUTION: An impulsive glow discharge voltage of about 900 V which is generated by a main circuit and is 10 KH in an inverter frequency is supplied to a treatment vessel (anode) and the object to be treated in the treatment vessel is subjected to a glow discharge treatment. The inverter frequency is made to 100 kHz by delaying the glow discharge voltage by prescribed a slight time from the start of the dead time period DT of the glow discharge voltage Δt simultaneously therewith. For example, the high-voltage peak pulses belonging to the glow discharge region of about 10 KV are supplied to the anode for high-voltage peak pulses and the object to be treated which is housed in the treatment vessel is subjected to the discharge treatment by these high-voltage peak pulses and, therefore, the temp. is locally raised only in the local part where the arc discharge current flows. The interatom distance is increased and the nitrogen N separated from iron nitride FeN is penetrated deep into the object to be treated. The nitrided layer and diffused layer may thus be rapidly and deeply formed.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:在不使这些层经历后期处理且不缩短辉光放电处理时间的情况下,厚厚地形成氮化层和扩散层直至被处理物体的深处。 ;解决方案:将由主电路产生的逆变器频率为10 KH的约900 V脉冲辉光放电电压提供给处理容器(阳极),并对处理容器中的待处理物体进行处理。辉光放电处理。通过同时从辉光放电电压Δt的空载时间段DT的开始将辉光放电电压延迟预定的时间,使逆变器频率达到100kHz。例如,将属于约10KV的辉光放电区域的高压峰值脉冲提供给用于高压峰值脉冲的阳极,并且通过以下方式对容纳在处理容器中的待处理物体进行放电处理:这些高压峰值脉冲和温度。仅在电弧放电电流流过的局部局部升高。原子间距离增加,并且与氮化铁FeN分离的氮N渗透到要处理的物体深处。氮化层和扩散层因此可以快速而深层地形成。;版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP2000017420A

    专利类型

  • 公开/公告日2000-01-18

    原文格式PDF

  • 申请/专利权人 PASCAL KK;

    申请/专利号JP19980187346

  • 申请日1998-07-02

  • 分类号C23C8/36;

  • 国家 JP

  • 入库时间 2022-08-22 02:02:18

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