首页> 外国专利> PATTERNING METHOD FOR HIGHLY FINE RIB, PATTERNING METHOD FOR LOW MELTING POINT GLASS, MOLDING METHOD FOR HIGHLY FINE RIB MADE OF LOW MELTING POINT GLASS, AND ETCHING COATING USED FOR PATTERNING OF HIGHLY FINE RIB

PATTERNING METHOD FOR HIGHLY FINE RIB, PATTERNING METHOD FOR LOW MELTING POINT GLASS, MOLDING METHOD FOR HIGHLY FINE RIB MADE OF LOW MELTING POINT GLASS, AND ETCHING COATING USED FOR PATTERNING OF HIGHLY FINE RIB

机译:高精细肋的构图方法,低熔点玻璃的构图方法,低熔点玻璃制成的高精细肋的模制方法以及用于高精细肋的形成的蚀刻涂层

摘要

PROBLEM TO BE SOLVED: To prevent damage of a low melting point glass during break-away of a resist, by forming a coating made of a material other than the low melting point glass and a photosensitive resin that are capable of etching in a machining board surface, forming a making pattern from an etching-resistant resist, and forming a negative pattern of a rib on the coating with etching.;SOLUTION: A material that is made of a material other than a low melting point glass and a photosensitive resin and is capable of etching is coated on a substrate to form a coating, this surface is patterned by an etching-resistant resist, and the low melting point glass is buried in a clearance where this material is patterned by etching. The etching-resistant resist on the surface is broken away or removed, and residual coating is etched and removed. In this case that a photosensitive dry film is used as the etching resistant resist, it can be perfectly baked and removed by selecting a baking condition and the buried low melting point glass can be removed without break-away.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:为了防止低熔点玻璃在抗蚀剂破裂过程中的损坏,通过形成一种由低熔点玻璃和光敏树脂以外的材料制成的涂层,该涂层可以在加工板上进行蚀刻表面;由抗腐蚀的抗蚀剂形成制作图案,并通过蚀刻在涂层上形成肋的负片图案;解决方案:由除低熔点玻璃和光敏树脂之外的材料制成的材料在基板上涂覆能够蚀刻的硅酸盐以形成涂层,通过抗蚀刻抗蚀剂对该表面进行图案化,并且将低熔点玻璃掩埋在通过蚀刻对该材料进行图案化的间隙中。表面上的耐蚀刻抗蚀剂被破坏或去除,并且残留的涂层被蚀刻并去除。在这种情况下,将光敏干膜用作抗腐蚀抗蚀剂,可以通过选择烘烤条件将其完美烘烤和除去,并且可以将埋入的低熔点玻璃除去而不会破裂。;版权所有:(C)2000 ,日本特许厅

著录项

  • 公开/公告号JP2000173455A

    专利类型

  • 公开/公告日2000-06-23

    原文格式PDF

  • 申请/专利权人 FUJI SEISAKUSHO:KK;

    申请/专利号JP19980343351

  • 发明设计人 MASE KEIJI;KANDA SHINJI;

    申请日1998-12-02

  • 分类号H01J9/02;H01J11/02;

  • 国家 JP

  • 入库时间 2022-08-22 02:01:07

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