POLYVINYLACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, MODIFIED POLYVINYLACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT- DEVELOPABLE PHOTOSENSITIVE MATERIAL

摘要

PROBLEM TO BE SOLVED: To improve the pot life of a soln. before application and the storage property and fog of a raw film and to improve sharpness of an image and gradation. ;SOLUTION: A polyvinylacetal resin or a modified polyvinyl acetal resin having modified groups comprising hydrophilic groups such as carboxyl groups in the side chains is used. The polymn. degree of the resin is 200 to 3000, the proportion of residual acetyl groups is 0 to 2 mol%, and the proportion of residual hydroxy group is 17 to 35 mol%. The resin does not contain an antioxidant and has ≤100 ppm content of residual halides. Especially preferably, the resin has ≤0.01 wt.% residual alkaline material content.;COPYRIGHT: (C)2000,JPO