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ALIGNING MECHANISM FOR WORK AND MASK

机译:工作和面膜协商机制

摘要

PROBLEM TO BE SOLVED: To provide an alignment machine of a work and mask which is capable of eliminating the inconvenience (for example, the case the accuracy determined by image pickup means cannot be achieved by the distortion of a casing and the vibration and heat at the time of working if the guide of the image pickup means are disposed on the casing side) by the mounting positions of the image pickup means and further minimizing the influence of the distortion by the characteristics of the lenses of the image pickup means. ;SOLUTION: This alignment mechanism has the image pickup means 2, 2 for picking up the images of the mask mark Mn for aligning the mask M having patterns and the work mark Wm of the work W, a control mechanism 10 which recognizes, computes, stores and controls the positions of both marks Mm, Wm picked up with the image pickup means 2, 2 and a moving means 7 which aligns the misalignment of both marks Mm, Wm by the control signal from the control mechanism 10. The image pickup means 2, 2 are composed as the alignment mechanism for the work W and mask M disposed via the moving mechanism 5 on a supporting base side (MF, 8) for supporting the mask M or the work W.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:提供一种工件和掩模的对准机,该对准机能够消除不便(例如,在图像拾取装置确定的精度不能通过壳体的变形以及振动和热量导致无法达到的情况下)的问题。 (如果图像拾取装置的引导件设置在壳体侧)的工作时间),并且通过图像拾取装置的透镜的特性进一步减小了畸变的影响。 ;解决方案:该对准机构具有图像拾取装置2、2,其用于拾取掩模标记Mn的图像,以对准具有图案的掩模M和工件W的工件标记Wm,控制机构10识别,计算,存储并控制由图像拾取装置2、2拾取的两个标记Mm,Wm的位置以及通过来自控制机构10的控制信号对准两个标记Mm,Wm的未对准的移动装置7。如图2,图2所示,作为工件W的对准机构和通过移动机构5在用于支撑掩模M或工件W的支撑基座侧(MF,8)上设置的掩模M。COPYRIGHT:(C)2000,日本特许厅

著录项

  • 公开/公告号JP2000089484A

    专利类型

  • 公开/公告日2000-03-31

    原文格式PDF

  • 申请/专利权人 ORC MFG CO LTD;

    申请/专利号JP19980259857

  • 发明设计人 OKAMURA TAKEHIKO;KANDA YUKIHIRO;

    申请日1998-09-14

  • 分类号G03F9/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:59:38

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