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ALUMINA DISPERSED POLISHING LIQUID AND PRODUCTION OF ALUMINA DISPERSED POLISHING LIQUID

机译:铝分散抛光液及铝分散抛光液的生产

摘要

PROBLEM TO BE SOLVED: To obtain the subject polishing liquid capable of avoiding trouble caused by thickening when dispersing alumina, the gelation, sedimentation, aggregation, etc., after the dispersion by including a nitrogen-containing monocarboxylic acid and a fine alumina dispersed in an aqueous dispersion medium and regulating the pH. ;SOLUTION: This polishing liquid is obtained by including a nitrogen- containing monocarboxylic acid (preferably nicotinic acid or glycine) and an alumina dispersed in an aqueous dispersion medium and having 5-100 nm average primary particle diameter (preferably the one selected from α-, θ-, γ- and δ-alumina) and regulating the pH to 3-6. The amount of the compounded alumina in the objective polishing liquid is preferably 15-50 wt.%. The nitrogen-containing monocarboxylic acid is preferably compounded in an amount of 1-5 pts.wt. based on 100 pts.wt. of the alumina. The objective polishing liquid is preferably prepared by adding the monocarboxylic acid into the aqueous dispersion medium, then regulating the aqueous medium to a weak acidic state and dispersing the alumina in the aqueous dispersion medium.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:通过在分散液中包含含氮的一元羧酸和微细的氧化铝,从而获得能够避免分散氧化铝时的增稠引起的麻烦,凝胶化,沉降,凝集等的目的的研磨液。水性分散介质并调节pH。 ;解决方案:该抛光液是通过将含氮的一元羧酸(最好是烟酸或甘氨酸)和氧化铝分散在水分散介质中而获得的,该氧化铝的平均初级粒径为5-100 nm(最好是选自α- ,θ-,γ-和δ-氧化铝),并将pH值调整为3-6。目标抛光液中氧化铝的混合量优选为15-50重量%。含氮的一元羧酸优选以1-5pts.wt的量混合。基于100pts.wt。氧化铝。优选地,通过将​​单羧酸加入到水性分散介质中,然后将水性介质调节至弱酸性状态并将氧化铝分散在水性分散介质中来制备目标抛光液。; COPYRIGHT:(C)1999,JPO

著录项

  • 公开/公告号JPH11349926A

    专利类型

  • 公开/公告日1999-12-21

    原文格式PDF

  • 申请/专利权人 TAIHO IND CO LTD;

    申请/专利号JP19980157909

  • 申请日1998-06-05

  • 分类号C09K3/14;

  • 国家 JP

  • 入库时间 2022-08-22 01:59:35

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