首页> 外国专利> PLASMA GENERATOR, ITS CHAMBER INNER WALL PROTECTIVE MEMBER, ITS MANUFACTURE, PROTECTING METHOD FOR CHAMBER INNER WALL AND PLASMA PROCESSING METHOD

PLASMA GENERATOR, ITS CHAMBER INNER WALL PROTECTIVE MEMBER, ITS MANUFACTURE, PROTECTING METHOD FOR CHAMBER INNER WALL AND PLASMA PROCESSING METHOD

机译:等离子发生器,其腔室内壁保护构件,其制造,腔室内壁的保护方法和等离子体处理方法

摘要

PROBLEM TO BE SOLVED: To provide a chamber inner wall protective member and its manufacturing method for a plasma generator preventing a yield reduction due to the metal pollution of a semiconductor wafer and a discharge foreign matter, facilitating the removal of a deposited film, reducing the dispersion of heat transfer to a chamber, and allowing uniform plasma processing, to provide the protecting method for the chamber inner wall of the plasma generator, and to provide the plasma generator and a plasma processing method. ;SOLUTION: This chamber inner wall protective member of a plasma generator is provided with a main member having a shape curved with a flat plate into a tubular shape, having an angle against the axial direction of the tube on at least one of both end faces in the curving direction, and having a gap decreased in interval between both end faces and a spacer having the shape to bury the gap between both end faces. A thermosetting resin is molded into a shape that the flat plate is curved into a tubular shape, and the main member is manufactured by the method including a glassy carbonization process.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:提供一种用于等离子体产生器的腔室内壁保护构件及其制造方法,以防止由于半导体晶片的金属污染和排出的异物而导致的成品率降低,从而有利于去除沉积膜,减少沉积物。分散热传递到腔室,并允许均匀的等离子体处理,以提供对等离子体发生器的腔室内壁的保护方法,并提供等离子体发生器和等离子体处理方法。 ;解决方案:该等离子体发生器的腔室内壁保护构件在其至少两个端面中的至少一个上具有主体构件,该主体构件具有通过平板弯曲成管状的形状,该主体构件与管的轴向成角度。并且,在弯曲方向上,间隔减小且在两个端面之间具有间隔,间隔件具有将两个端面之间的间隔埋入的形状。将热固性树脂成型为平板弯曲成管状的形状,并通过包括玻璃碳化工艺的方法制造主体。COPYRIGHT:(C)2000,JPO

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