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The field production of thin film sample for transmission electron microscope and observation manner and that device

机译:透射电子显微镜薄膜样品的现场生产及观察方法及装置

摘要

PURPOSE: To observe a sample without being contaminated by emitting a focused ion beam to the sample under the observation with a transmission type electron microscope, and observing a specified local area of the sample simultaneously with polishing. ;CONSTITUTION: A focused ion bean(FIB) column 1 is mounted obliquely above and in front of the sample chamber of a scanning transmission type electron microscope, so that a beam can be guided to a sample position from the obliquely upper part of the objective pole piece 2 of the scanning transmission type electron microscope. The scanning type secondary electron detector of the scanning transmission type electron microscope is used also for the drawing with FIB. A thin film preliminarily formed by ion polishing is set in the sample chamber of the scanning transmission type electron microscope. While the electron beam is radiated to the thin film to observe it in real time, an ion beam is radiated to the thin film under observation from the column 1. The beam diameter of the FIB is regulated to set the polishing area, and the scanning speed is regulated to precisely and finely polish the sample surface followed by observation.;COPYRIGHT: (C)1995,JPO
机译:目的:通过在透射型电子显微镜的观察下向样品发射聚焦离子束,并在抛光的同时观察样品的指定局部区域,以观察样品而不受污染。 ;组成:聚焦离子豆(FIB)柱1倾斜安装在扫描透射型电子显微镜样品室的上方和前方,因此可以将光束从物镜的倾斜上方引导到样品位置扫描透射型电子显微镜的极片2。扫描透射型电子显微镜的扫描型二次电子检测器也用于FIB制图。预先通过离子抛光形成的薄膜被放置在扫描透射型电子显微镜的样品室中。在电子束辐射到薄膜上进行实时观察的同时,离子束从柱1观察到辐射到薄膜。调节FIB的束直径以设置抛光区域,然后扫描调节速度以精确和精细地抛光样品表面,然后进行观察。;版权所有:(C)1995,日本特许厅

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