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Inhibitors of attack quìmico in developer solution for lithographic printing plates.

机译:平版印刷版显影剂溶液中的腐蚀抑制剂。

摘要

b inhibitors of attack quu00ecmico in developer solution for lithographic printing plates " d .Composition for photosensitive elements reveals including lithographic printing plates, films, protective color,Lithographic plates, positive and negative plates thermally sensitive and providing high contrast image and attack of oxide reduced to areas of the image.The composition comprises: a source of hydroxyl ions sufficient to provide the composition revealing a pH from approximately 10 to approximately 14; an optional compensator; one adDevices inhibitor chemical attack, and sufficient water to produce a composition revealing. Also revealed is a process to form an image.
机译:平版印刷版显影液中的腐蚀抑制剂。感光元件的成分包括平版印刷版,胶片,保护色,平版印刷版,正负版对热敏感并提供高对比度该组合物包括:氢氧根离子源,足以使该组合物显示约10至约14的pH值;可选的补偿剂;一种adDevices抑制剂,化学腐蚀作用,以及足够的水产生构图的揭示,也揭示了形成图像的过程。

著录项

  • 公开/公告号BR9803873A

    专利类型

  • 公开/公告日2000-03-14

    原文格式PDF

  • 申请/专利权人 BAYER CORPORATION;

    申请/专利号BR19989803873

  • 发明设计人 PAUL E. ECKLER;

    申请日1998-10-05

  • 分类号G03G9/12;G03F7/32;

  • 国家 BR

  • 入库时间 2022-08-22 01:57:16

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