KOMPOSISI UNTUK PEMOLESAN KIMIA MEKANIK TERHADAP LAPISAN PADA MATERIAL ISOLASI YANG BERDASARKAN PADA POLIMER DENGAN KONSTANTA DIELEKTRIK RENDAH

摘要

A composition of the chemical mechanical polishing - with a layer of insulating material based on polymer with a low dielectric constant, comprising an acid aqueous suspension of silica, colloidal cationised containing particles of colloidal silica individualized, not linked together by siloxane bonds and of the water as a suspension medium, a method of chemical mechanical polishing - with a layer of insulating material based on polymer with a low dielectric constant, and for the chemical mechanical polishing - with a layer of insulating material based on polymer with a low dielectric constant.