FORM SIMULATION DEVICE AND ITS SIMULATING METHOD BY THE USE OF THE MONTE CARLO METHOD

摘要

A bulk plasma analysis unit that analyzes the bulk plasma region and calculates the time variation of the potential, particle density, and sheath length in the plasma when RF bias is applied, and the type of incident particles based on the obtained particle density. The surface reaction calculation section that determines the adsorption of the sheath plasma analysis section and the surface of the target material to which the incident particles collide, and determines the type of reaction between the incident particles and the adsorbed species determined by the sheath plasma analysis section. And a shape simulation device including shape calculation means for calculating the shape of the material to be etched according to the type of reaction determined by the surface reaction calculation unit.