PHOTO SENSITIVE POLYMER HAVING BACKBONE OF CIRCULAR STRUCTURE AND REGIST CONSTITUTION

• 1. 具有多环结构的醚单体和聚合物，和使用其得到的光敏聚合物和抗蚀剂组合物 [P] . 中国专利： CN100494226C . 2009.06.03
• 2. 具有多环结构的醚单体和聚合物，和使用其得到的光敏聚合物和抗蚀剂组合物 [P] . 中国专利： CN1637027A . 2005-07-13
• 3. PHOTOSENSITIVE POLYMER HAVING ANNULAR BACKBONE STRUCTURE AND RESIST COMPOSITION CONTAINING THE SAME [P] . 韩国专利： KR20010047840A . 2001-06-15

  机译： 具有环形骨架结构且包含相同骨架的光致抗蚀剂的光敏聚合物

• 4. Resist composition containing photosensitive polymer having cyclic structure in its backbone [P] . 韩国专利： KR20010076843A . 2001-08-16

  机译： 骨架中含有具有环状结构的感光性聚合物的抗蚀剂组合物

• 5. Photosensitive polymer having a cyclic structure of the backbone and a resist composition comprising the same [P] . 韩国专利： KR100281902B1 . 2001-03-02

  机译： 具有主链环状结构的光敏聚合物和包含其的抗蚀剂组合物

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• 6. Catalysts and Initiators as Instruments Controlling Structure of Polymers with Inorganic Backbone. [R] . Matyjaszewski, K. 1991

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