DEVICE FOR SUPPLYING TREATING LIQUID AND VALVE DEVICE FOR OPENING AND CLOSING FLUID PASSAGE FOR TREATING LIQUID SUPPLYING DEVICE

摘要

PURPOSE: A device for supplying a treating liquid is provided to continuously adjust the temperature of the treating liquid flowing through a treating liquid supplying pipe. CONSTITUTION: A developing liquid supplying device(2) is connected to a developing device(1). Herein, the developing device includes; a nozzle unit(4) for supplying a developing liquid(treating liquid) onto the surface of a semiconductor wafer(treated target substrate)(3); and a spin chuck apparatus(5) for maintaining the wafer by using a vacuum absorption while rotating the semiconductor wafer. Therefore, the semiconductor wafer is rotated by the spin chuck apparatus for dispersing the supplied developing liquid on the surface of the semiconductor wafer, and the developing liquid is supplied evenly on the whole surface of the semiconductor wafer.