POLYESTER FILM FOR BASE FILM OF PHOTORESIST FILM

摘要

PURPOSE: A polyester film for the base film of a photoresist film comprising a polyester resin and inorganic slip agents is provided which is excellent in wind ability, transparency and adhesive property to a base plate. CONSTITUTION: A polyester film for use as the base film of a photoresist film comprises(a)a polyester resin containing 80 to 90 mol % of ethyleneterephthalate units and 10 to 20 mol % of alkyleneterephthalate units and having a limit viscosity of 0.5 to 0.7 dl/gr and 0.05 to 0.5 % by weight of inorganic slip agents having an average particle diameter of 0.6 to 2.6 micrometer and a coefficient of planar orientation of 0.06 to 0.18 based on the weight of the polyester resin. The photoresist film used as a base film the film is excellent in resolution, defect resistance, pinhole resistance.