首页> 外国专利> FORMING METHODS OF GRATING HAVING CONTINUOUSLY SHIFTING PITCH AND LASER DIODES EMITTING BEAMS OF DIFFERENT WAVELENGTH USING THE GRATING

FORMING METHODS OF GRATING HAVING CONTINUOUSLY SHIFTING PITCH AND LASER DIODES EMITTING BEAMS OF DIFFERENT WAVELENGTH USING THE GRATING

机译:光栅连续变距光栅和激光二极管发射光束的形成方法

摘要

PURPOSE: A method of forming a grating which has a continuously shifting pitch and a method of forming laser diodes each of which emits a beam of different wavelength are provided to reduce production cost, to enable mass production, and to easily adjust the pitch of the grating. CONSTITUTION: A wafer(1) is coated with a photoresist layer(2), and a mirror(5) is arranged by the side of the wafer(1). In addition, a light source(3) to emit spherical light is positioned apart from the wafer(1) and the mirror(5). The distance between the wafer(1) and the light source(3), and an angle between the wafer(1) and the mirror(5) are all adjusted to correspond to a pitch of a grating to be formed on the wafer(1). The photoresist layer(2) is then exposed to interferential light between direct light(4) of a light source(3) and reflected light(6) of the mirror(5). After the exposed photoresist layer(2) is developed, the wafer(1) is etched to form the grating having the continuously shifting pitch. In this manner, laser diodes each of which can emit a beam of different wavelength are formed on the single wafer(1).
机译:用途:提供一种形成具有连续变化的间距的光栅的方法以及一种形成各自发射不同波长光束的激光二极管的方法,以降低生产成本,实现批量生产并易于调节其间距。光栅。组成:晶片(1)涂有光致抗蚀剂层(2),并在晶片(1)的侧面布置了镜子(5)。另外,发射球形光的光源(3)与晶片(1)和反射镜(5)分开放置。晶片(1)与光源(3)之间的距离以及晶片(1)与反射镜(5)之间的角度均被调整为与要在晶片(1)上形成的光栅的间距相对应。 )。然后将光致抗蚀剂层(2)暴露在光源(3)的直接光(4)和反射镜(5)的反射光(6)之间的干涉光下。在曝光的光致抗蚀剂层(2)显影之后,对晶片(1)进行蚀刻以形成具有连续变化的间距的光栅。以这种方式,在单个晶片(1)上形成每个可以发射不同波长的光束的激光二极管。

著录项

  • 公开/公告号KR20000034527A

    专利类型

  • 公开/公告日2000-06-26

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR19980051866

  • 发明设计人 HA. HONG CHUN;

    申请日1998-11-30

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-22 01:45:45

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