首页> 外国专利> HIGHLY HEAT-RESISTANT POLYAMIDEIMIDE RESIN CONTAINING CYCLOHEXYLIDENE-BASED ALIPHATIC RING AND PREPARATION THEROF

HIGHLY HEAT-RESISTANT POLYAMIDEIMIDE RESIN CONTAINING CYCLOHEXYLIDENE-BASED ALIPHATIC RING AND PREPARATION THEROF

机译:含环己烯基脂环的高耐热性聚酰亚胺树脂及其制备方法

摘要

PURPOSE: A soluble polyamideimide resin which conserves properties of the conventional polyamideimide resin and has good solubility, formability and processing property as well as has excellent heat-resistance to be used as an essential heat-resistant material in various electric, electronic and aviation industries is provided. CONSTITUTION: A polyamideimide resin according to the present invention comprises a repeating unit of the formula (1): £formula 1| wherein R' is one or more groups selected from the group consisting of the following and formula (I) to (VII) provided that the resin necessarily comprises a functional group selected from the group consisting of the formula (I) to (VII). The polyamideimide resin according to the present invention is prepared by reacting trimellitic chloride with one or more aromatic diamines of the formula 2: £formula 2| wherein R is hydrogen, 4-methyl, 4-ethyl, 4-t-butyl, 4-amyl, 4-phenyl or 3,3,5-trimethyl, R' is one or more groups selected from the group consisting of the following and formula (I) to (VII) provided that the resin necessarily comprises a functional group selected from the group consisting of the formula (I) to (VII).
机译:用途:一种可溶性聚酰胺酰亚胺树脂,它保留了常规聚酰胺酰亚胺树脂的性能,并具有良好的溶解性,可成型性和加工性能,并且具有优异的耐热性,可在各种电气,电子和航空工业中用作基本的耐热材料。提供。组成:根据本发明的聚酰胺酰亚胺树脂包含式(1)的重复单元:式1 |其中R′是选自下式和式(I)至(VII)的一个或多个基团,条件是树脂必须包含选自式(I)至(VII)的官能团。通过使偏苯三甲酰氯与一种或多种式2的芳族二胺反应来制备根据本发明的聚酰胺酰亚胺树脂:其中R是氢,4-甲基,4-乙基,4-叔丁基,4-戊基,4-苯基或3,3,5-三甲基,R'是一个或多个选自以下的基团式(I)至(VII)的条件是树脂必须包含选自式(I)至(VII)的官能团。

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