TTL ALIGNMENT APPARATUS USING TOTALLY INTERNAL REFLECTION TYPE HOLOGRAPH

摘要

The present invention is to perform a TTL alignment to correct the chromatic aberration by generating a phase conjugate wave (total internal reflection holography) in the TTL alignment apparatus of a stepper or scanner for manufacturing a semiconductor device Relates to a device. Among the holographic methods, the internal total reflection holography, in particular, has a simple structure, which is advantageous in the arrangement of the alignment system, and since the reference light does not affect the optical system, there is an advantage that the semiconductor exposure equipment has little effect on the projection optical system. Based on this technique, the incident refraction optical system 102 and the reflector are used to directly align the position of the reticle and the wafer in the wafer stepper using the ArF excimer laser light as the exposure light source. 103 and polarized light splitter 104; A concave reflector 105 and an emission optical system 106 for reducing and projecting the pattern onto a wafer; TTL alignment means which is incident through the fiber from the light source of the argon laser 110; The alignment light 111 projected into the reflection-refraction system by the TTL alignment means is divided into wafer alignment light 112 and reticle alignment light 114 so as to be projected onto the reticle 108 and the wafer 107 respectively. Light splitter 104; It consists of a single-mode fiber 202 to transmit the alignment light from the argon laser 110 to the total internal reflection holographic TTL alignment means, the TTL alignment means is to use the internal total reflection hologram alignment system 200 It features.