Electron beam exposure device control method uses address grid defined by stepping widths of positioning and format control systems provided with positioning and format correction systems

摘要

Electron beam exposure device control method uses address grid defined by stepping widths of positioning and format control systems provided with positioning and format correction systems. The control method uses an address grid for pattern generation defined by the stepping widths of positioning and format control systems which are provided with associated positioning and format correction systems. The figures which are exposed with the same position of the correction systems are combined in an additional sub field, with the sub field information converted into a machine code layout representation, the deflection and correction systems controlled by deflection, correction and sub field parameters.