Production of porous silicon oxide film useful as antireflection coating on glass or transparent plastics, involves using self-shading or atoms and molecules in plasma-enhanced chemical vapor deposition

摘要

Production of silicon oxide (SiOx) films comprises plasma-enhanced chemical vapor deposition (PECVD) and growing porous films on a substrate by self-shading of the atoms and molecules during production. An Independent claim is also included for SiOx films produced in this way.