Photomask has transparent base and shading structure contg. polygonal circuit structure with inclined line printed out as series of steps with number of rectangles of defined width

摘要

The photomask has a transparent base (2) and a shading structure (3b) contg. a polygonal circuit structure with an inclined line that is printed out as a series of steps with a number of rectangles (4x,4y). The width of the rectangles lies between the limit of resolution of a mask printer and the product of the limit of resolution of a projection exposure arrangement and the magnification of a projection exposure arrangement. An Independent claim is also included for a method of using a photomask.