Elimination of 90 and 180 phase errors in qam - receivers

摘要

The method includes the steps of coating a layer(10), to be patterned, with photoresist(PR), patterning the photoresist layer(PR) into a predetermined pattern using photolithography, anisotropic-etching the photoresist layer to form polymer(13) on the sides of the photoresist pattern, and etching the layer(10) using the photoresist pattern and polymer.